The Vacuubrand MD 4C NT is a high-performance, oil-free diaphragm vacuum pump designed for chemical laboratories requiring reliable and contamination-free vacuum generation. Operating at 230 V with a Swiss (CH) plug, this three-stage pump offers a maximum pumping speed of 3.4 m³/h and achieves an ultimate vacuum of 1.5 mbar (1.1 torr). Its chemically resistant construction ensures durability when handling aggressive solvents and vapors.
This pump is ideal for applications such as vacuum filtration, rotary evaporation, and degassing in chemical laboratories, offering maintenance-free operation with high chemical resistance.
It is a high-performance, oil-free diaphragm vacuum pump designed for chemical laboratories requiring reliable and contamination-free vacuum generation. Operating at 230 V with a Swiss (CH) plug, this three-stage pump offers a maximum pumping speed of 3.4 m³/h and achieves an ultimate vacuum of 1.5 mbar (1.1 torr). Its chemically resistant construction ensures durability when handling aggressive solvents and vapors.
Yes. It is designed for chemical laboratories requiring reliable and contamination-free vacuum generation, and offers a voltage/frequency of 230 V / 50 Hz and a maximum pumping speed of 3.4 m³/h (50 Hz) to support this kind of work.
It has a voltage/frequency of 230 V / 50 Hz, a maximum pumping speed of 3.4 m³/h (50 Hz) and an ultimate vacuum of 1.5 mbar (1.1 torr), and is supplied under manufacturer part number 20736401.
It offers hose nozzle DN 8–10 mm, IP 40 (IEC 60529), -10°C to 60°C and NRTL certified.
For chemical laboratories requiring reliable and contamination-free vacuum generation, the VACUUBRAND model is the better choice, offering a voltage/frequency of 230 V / 50 Hz, a maximum pumping speed of 3.4 m³/h (50 Hz) and an ultimate vacuum of 1.5 mbar (1.1 torr). The KNF model offers a voltage of 115V, 60Hz (US Plug) as an alternative, while the VACUUBRAND model's hose nozzle DN 8–10 mm and IP 40 (IEC 60529) help make it a strong fit for chemical laboratories requiring reliable and contamination-free vacuum generation.
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